Key Personnel: VP: Fred Namek, Dom Sls Mgr: Eric Namek

Description: Manufactures manual and automated single/double-sided cleaning systems and other related equipment for the semiconductor and microelectronic industries. Specializes in wafer, photomask and substrate cleaning. Utilizes single- or double-sided high pressure DI nozzles, brush, ozone and megasonic options. Also offers spin coaters for coating up to 16-inch square plates, batch developers and DI water COv(2) reionizers.